Nanoscale Noncollinear Spin Textures in Thin Films of a D2d Heusler Compound

Magnetic nano-objects, namely antiskyrmions and Bloch skyrmions, have been found to coexist in single-crystalline lamellae formed from bulk crystals of inverse tetragonal Heusler compounds with D2d symmetry. *

Skyrmions can be observed in real-space by various direct imaging techniques. *

In the article “Nanoscale Noncollinear Spin Textures in Thin Films of a D2d Heusler Compound”  Ankit K. Sharma, Jagannath Jena, Kumari Gaurav Rana, Anastasios Markou, Holger L. Meyerheim, Katayoon Mohseni, Abhay K. Srivastava, Ilya Kostanoskiy, Claudia Felser and Stuart S. P. Parkin  describe the use of magnetic force microscopy (MFM) imaging to investigate magnetic textures in epitaxial thin films of [001]-oriented Mn2RhSn formed by magnetron sputtering.*

They find evidence for magnetic nano-objects which exhibit a wide range of sizes with stability with respect to magnetic field and temperature that is similar to single-crystalline lamellae. *

However, the nano-objects do not form well-defined arrays, nor is any evidence found for helical spin textures. This is speculated to likely be a consequence of the poorer homogeneity of chemical ordering in the thin films. *

Evidence is found for elliptically distorted nano-objects along perpendicular crystallographic directions within the epitaxial films, which is consistent with elliptical Bloch skyrmions observed in single-crystalline lamellae. Thus, these measurements provide strong evidence for the formation of noncollinear spin textures in thin films of Mn2RhSn. *

Using these films, it is shown that individual nano-objects can be deleted using a local magnetic field from a magnetic AFM tip and collections of nano-objects can be similarly written. *

For writing and deleting the nano-objects, magnetic AFM probes from NanoWorld of the Pointprobe® MFMR type were used. *

These observations described in the article suggest a path toward the use of these nano-objects in thin films with D2d symmetry as magnetic memory elements paving the way to the realization of skyrmionic devices based on Heusler thin films. *

Figure 5 from Ankit K. Sharma et al. Nanoscale Noncollinear Spin Textures in Thin Films of a D2d Heusler Compound : Controlled creation and annihilation of nano-objects in a 35 nm-thick Mn2RhSn thin film. a) Schematic illustration of magnetization orientations of MFM tip and sample for writing. The distance between tip and the sample is the scan height z. b–e) MFM images in zero field and z = 80, 40, 30, and 20 nm, respectively at 200 K. f) Contact-mode image in zero field and 200 K. The blue and red colors represent up and down magnetization, respectively. Images in (b)–(f) are at the same scale: a scale bar is given in (f). g–i) MFM images taken at z = 70, 50, and 30 nm at 100 K under Hz = 180 mT. Images in (g)–(i) are at the same scale: a scale bar is given in (i). For writing and deleting the nano-objects, magnetic AFM probes from NanoWorld of the Pointprobe® MFMR type were used.
Figure 5 from Ankit K. Sharma et al. Nanoscale Noncollinear Spin Textures in Thin Films of a D2d Heusler Compound :
Controlled creation and annihilation of nano-objects in a 35 nm-thick Mn2RhSn thin film. a) Schematic illustration of magnetization orientations of MFM tip and sample for writing. The distance between tip and the sample is the scan height z. b–e) MFM images in zero field and z = 80, 40, 30, and 20 nm, respectively at 200 K. f) Contact-mode image in zero field and 200 K. The blue and red colors represent up and down magnetization, respectively. Images in (b)–(f) are at the same scale: a scale bar is given in (f). g–i) MFM images taken at z = 70, 50, and 30 nm at 100 K under Hz = 180 mT. Images in (g)–(i) are at the same scale: a scale bar is given in (i).

*Ankit K. Sharma, Jagannath Jena, Kumari Gaurav Rana, Anastasios Markou, Holger L. Meyerheim, Katayoon Mohseni, Abhay K. Srivastava, Ilya Kostanoskiy, Claudia Felser, Stuart S. P. Parkin
Nanoscale Noncollinear Spin Textures in Thin Films of a D2d Heusler Compound
Advanced Materials, Volume 33, Issue 32, August 12, 2021, 2101323
DOI: https://doi.org/10.1002/adma.202101323

Open Access The article “Nanoscale Noncollinear Spin Textures in Thin Films of a D2d Heusler Compound” Ankit K. Sharma, Jagannath Jena, Kumari Gaurav Rana, Anastasios Markou, Holger L. Meyerheim, Katayoon Mohseni, Abhay K. Srivastava, Ilya Kostanoskiy, Claudia Felser and Stuart S. P. Parkin is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

Electrochromic switching of tungsten oxide films grown by reactive ion-beam sputter deposition

Because of the global climate change, energy-saving and sustainable technologies are becoming more and more important. Therefore, the demands on technologies for the conversion, storage and use of renewable energies are constantly growing. *

The building sector plays an important role in terms of energy saving potential. *

In particular, the class of so-called smart windows offers an approach to save energy in the building sector by efficiently regulating incident light. *

Chromogenic thin films are crucial building blocks in smart windows to modulate the flux of visible light and heat radiation into buildings. *

Due to their diversity in composition and structure as well as their superior performance, electrochromism based on thin film transition metal oxides has become increasingly important in the last decade. *

Electrochromic materials such as tungsten oxide are well established in those devices. Sputter deposition offers a well-suited method for the production of such layers, which can also be used on an industrial scale. *

The EC properties of tungsten oxide layers depend on the composition, the crystal structure and the morphology. *

The film characteristics are strongly dependent on the growth technique. *

In the article “Electrochromic switching of tungsten oxide films grown by reactive ion-beam sputter deposition” Mario Gies, Fabian Michel, Christian Lupó, Derck Schlettwein, Martin Becker and Angelika Polity describe how Tungsten oxide thin films were grown by ion-beam sputter deposition (IBSD), a less common sputtering variant. *

They then show the possibility of influencing technologically relevant samples characteristics by using different preparation parameters (e.g., gas mixture or growth temperature). This allows to tune the elemental composition, optical properties or to influence the structure and the degree of crystallization in the resulting thin films. *

The high reproducibility as well as the high purity of IBSD-grown layers render ion-beam sputter deposition a suitable candidate for growth of tungsten oxide and, most likely, other chromogenic materials. *

Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were conducted to analyze the crystallite surface structure.

For the AFM investigations in air NanoWorld® Pointprobe® SEIHR AFM probes designed for soft non-contact mode imaging were used. (typical resonance frequency 130 kHz, typical force constant 15 N/m ). *

Figure 2 g, h and i from "Electrochromic switching of tungsten oxide films grown by reactive ion-beam sputter deposition" by Miario Gies et al. In Fig. 2 g, the surface of a sample deposited at RT and a moderate O2 flux of 5.15 sccm is shown as analyzed by Atomic Force Microscopy ( AFM ). Individual grains of about 0.2 μm size appear interconnected without sharply defined grain boundaries. The root-mean-square surface roughness was determined to be around 9 nm. In comparison, Fig. 2h shows the morphology of a sample synthesized at RT under oxygen-poor conditions. Again, no sharply defined grains are recognizable. However, the grains seem to be a bit more extended. The determined roughness of the surface is approximately 7 nm. At an increased deposition temperature of 400 ∘C, larger round-shaped grains of about 0.5 μm lateral expansion were obtained, cf. Fig. 2i, leading to an increased roughness of around 20 nm, much higher than for the unheated samples. NanoWorld Pointprobe SEIHR AFM probes were used.
Figure 2 g, h and i from “Electrochromic switching of tungsten oxide films grown by reactive ion-beam sputter deposition” by Mario Gies et al.:
AFM images of samples, deposited at room temperature under a moderate O2 flux of 5.15 sccm (g) and under oxygen-poor conditions (h). Compared to the surface of a sample grown at 400 ∘C (i), the surface roughness is significantly smoother. For the full figure please refer to the full article: https://link.springer.com/article/10.1007/s10853-020-05321-y

*Mario Gies, Fabian Michel, Christian Lupó, Derck Schlettwein, Martin Becker and Angelika Polity
Electrochromic switching of tungsten oxide films grown by reactive ion-beam sputter deposition
Journal of Materials Science (2020)
DOI: https://doi.org/10.1007/s10853-020-05321-y

Please follow this external link to read the full article: https://link.springer.com/article/10.1007/s10853-020-05321-y

Open Access : The article “Electrochromic switching of tungsten oxide films grown by reactive ion-beam sputter deposition” by Mario Gies, Fabian Michel, Christian Lupó, Derck Schlettwein, Martin Becker and Angelika Polity is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit https://creativecommons.org/licenses/by/4.0/.