Author: NanoWorld

Real-space images of polymers with sub-molecular resolution could provide valuable insights into the relationship between morphology and functionality of polymer optoelectronic devices, but their acquisition is problematic due to perceived limitations in atomic force microscopy (AFM).*

In the article “Ultra-high resolution imaging of thin films and single strands of polythiophene using atomic force microscopy” Vladimir V. Korolkov, Alex Summerfield, Alanna Murphy, David B. Amabilino, Kenji Watanabe, Takashi Taniguchi and Peter H. Beton show that individual thiophene units and the lattice of semicrystalline spin-coated films of polythiophenes (PTs) may be resolved using AFM under ambient conditions through the low-amplitude (≤ 1 nm) excitation of higher eigenmodes of a cantilever.*

They authors demonstrate that the use of higher eigenmodes in tapping-mode ambient AFM can be successfully employed to characterize both individual polymer strands down to a single-atom level and also the ordering of a semi-crystalline polymer with technological relevance. The combination of AFM and solution deposition provides a simple and high-resolution approach to characterizing the structure of polymers.*

The use of NanoWorld Arrow-UHF high frequency AFM probes at their first eigenmode of ~1.4 MHz is mentioned.*

*Vladimir V. Korolkov, Alex Summerfield, Alanna Murphy, David B. Amabilino, Kenji Watanabe, Takashi Taniguchi and Peter H. Beton
Ultra-high resolution imaging of thin films and single strands of polythiophene using atomic force microscopy
Nature Communications, volume 10, Article number: 1537 (2019)
doi: https://doi.org/10.1038/s41467-019-09571-6

Please follow this external link to read the full article: https://rdcu.be/bLSdL

Open Access: The article « Ultra-high resolution imaging of thin films and single strands of polythiophene using atomic force microscopy » by Vladimir V. Korolkov, Alex Summerfield, Alanna Murphy, David B. Amabilino, Kenji Watanabe, Takashi Taniguchi and Peter H. Beton is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.